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2024年12月27日发(作者：档案汇编是什么意思)

专利内容由知识产权出版社提供

专利名称：Substrate cleaning/drying equipment and

substrate cleaning/drying method

发明人：Kazuhiko Takase,Yuji Fukazawa

申请号：US09/206360

申请日：19981207

公开号：US06152153A

公开日：20001128

摘要：There is provided a substrate cleaning/drying equipment for removing residual

moisture from a substrate by exposing the substrate to an IPA steam after the substrate

has been cleaned by a ultra pure water. The substrate cleaning/drying equipment

comprises a cleaning/drying chamber for cleaning/drying the substrate, a cleaning tub

which is provided below the cleaning/drying chamber and to which at least a ultra pure

water is supplied, an IPA steam supplying pipe for supplying the IPA steam to an upper

area of the cleaning/drying chamber such that the upper area of the cleaning/drying

chamber is filled with the IPA steam, a steam supplying pipe for supplying a steam

between the ultra pure water in the cleaning tub and the IPA steam, and a carrying unit

for carrying the substrate, which has been cleaned by the ultra pure water, from the ultra

pure water into the IPA steam via the steam. The ultra pure water, the steam, the IPA

steam may be supplied onto the substrate by using injection nozzles respectively in

order of the ultra pure water, the steam, the IPA steam.

申请人：KABUSHIKI KAISHA TOSHIBA

代理机构：Finnegan, Henderson, Farabow, Garrett & Dunner, LP.

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