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2024年12月29日发(作者：linux查看环境变量)

专利内容由知识产权出版社提供

专利名称：Manufacturing method of laminate

发明人：花岡 秀典,山川 勝平

申请号：JP2017102994

申请日：20170524

公开号：JP2018197378A

公开日：20181213

专利附图：

摘要：Problem to be solved: to provide a method of manufacturing a laminate

capable of suppressing yellowing of a thin film layer. A method of manufacturing a

laminate containing a base material f and a thin film layer laminated on at least one

surface of the substrate f using a plasma chemical vapor deposition method, the

substrate f is disposed on a pair of deposition rolls 17 and 18, and a material gas and a

reaction gas between a pair of film forming rolls 17 and 18 A film forming gas G including

the roll 17 is supplied.A method of laminating a thin film layer on at least one surface of a

substrate by decomposing and reacting a source gas and a reaction gas by plasma

discharge produced between the two, wherein the raw material gas is an organosilane

compound, and the B * value in the L * a * b * color space of the produced laminate is 6 or

less Law. Diagram

申请人：住友化学株式会社

地址：東京都中央区新川二丁目２７番１号

国籍：JP

代理人：田中 光雄,山田 卓二,森住 憲一

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