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2024年12月29日发(作者：jsoup爬虫库)

专利内容由知识产权出版社提供

专利名称：HOLE STRUCTURE AND METHOD FOR

MANUFACTURING SAME, ARRAY

SUBSTRATE AND METHOD FOR

MANUFACTURING SAME, DETECTION

DEVICE, AND DISPLAY DEVICE

发明人：JIANG, Feng,TIAN, Hui,ZHANG, Xiaolong,LIN,

Chia Chiang

申请号：EP16874083.5

申请日：20160520

公开号：EP3425663A1

公开日：20190109

专利附图：

摘要：A hole structure and a fabrication method thereof, an array substrate and a

fabrication method thereof, a detection device and a display device are provided. The

fabrication method of the hole structure comprises: performing a first photolithography

process on a first initial thin film (110') with a pattern region (191) of a mask (190) to form

a first thin film (110) and a first hole (111) located therein, and performing a second

photolithography process on a second initial thin film (120') covering the first thin film

(110) with the pattern region (191) of the mask (190) to form a second thin film (120) and

a second hole (121) running through the second thin film (120) and communicating with

the first hole (111); a dimension (d22) of a second opening (121b) of the second hole (121)

away from a base substrate (101) is larger than a dimension (d21) of a first opening (121a)

of the second hole (121) close to the base substrate (101).

申请人：BOE Technology Group Co., Ltd.,KA Imaging Inc.

地址：No. 10 Jiuxianqiao Road Chaoyang District Beijing 100015 CN,809 Wellington St

N Kitchener, Ontario N2H 5L6 CA

国籍：CN,CA

代理机构：Klunker IP Patentanwälte PartG mbB

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