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2024年12月28日发(作者：花边边框卡通可爱)

专利内容由知识产权出版社提供

专利名称：ALIGNING DEVICE

发明人：JIYANUSUZU SUTANISUROU

UIRUKUJINSUKII

申请号：JP21478082

申请日：19821209

公开号：JPS58122729A

公开日：19830721

摘要：An alignment system is described for lithographic proximity printing apparatus

wherein the wafer (10) and lithographic mask (14) are each individually aligned with an

alignment mask (30). The alignment mask (30) carries an alignment pattern (66)

corresponding to an alignment mark (56) on the microcircuit wafer (10) and also carries

an alignment pattern (70) corresponding to an alignment mark (60) on the proximity

printing mask (14). The alignment mask is illuminated by radiation source 54 and the

alignment patterns carried by the alignment mask (30) are imaged onto the

corresponding wafer (10) and proximity printing mask (16) alignment marks. Since the

projected alignment patterns are spatially separated at the alignment mask one of the

alignment patterns is conveniently shifted in effective optical position by glass block 42

to compensate for the difference in axial position of the wafer and printing mask

alignment marks. When a projected alignment pattern image correlates with (i.e.,

overlays) the corresponding alignment mark, reflected or scattered light leaving the

alignment mark is either at a maximum or at a minimum (i.e., an extremum) depending

upon the system configuration. A light splitter (72) deflects some of the light coming

from each of the alignment marks to individual photomultipliers 84, 86. Alignment of the

wafer and printing mask has been achieved when both photomultiplier outputs reach the

correct extremum simultaneously (or reach the midpoint of the correct extremum if the

extremum is not sharp).

申请人：INTERN BUSINESS MACHINES CORP

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