admin 管理员组

文章数量: 1087135


2024年12月27日发(作者：php168地方门户系统)

专利内容由知识产权出版社提供

专利名称：SUBSTRATE HEATER

发明人：NAKADA RENPEI

申请号：JP822690

申请日：19900119

公开号：JPH03215670A

公开日：19910920

摘要：PURPOSE:To efficiently heat a substrate and to suppress the temp. rise of a

fixing jig as well as to prevent the sticking of thin films by fixing the substrate by the fixing

jig onto a sample base, heating the substrate, providing a heat reflecting means in the

fixing jig and reflecting the heat of a heating means. CONSTITUTION:The substrate 7 is

mounted via a heater 8 on a quartz susceptor 6 and is fixed by the fixing jig 12 in a

reaction chamber 3 in a vessel 1 which is equipped with a cooling pipe 2 to allow cooling.

The above-mentioned heater 8 is constituted by enclosing a tungsten wire 9 connected

with copper wires 11 with alumina 10. The substrate 7 is heated to a prescribed temp. by

this heater 8 and while vacuum evacuation is made from a discharge port 5, gaseous raw

materials introduced from a pipe 4 are cracked and the thin film is formed on the

substrate. An aluminum film 13 is provided between the heater 8 and fixing jig 12 of the

above-mentioned substrate heater for a CVD method to reflect the heat of the heater 8.

The heating efficiency is improved by utilizing reflected heat for substrate heating and

the temp. rise of the fixing jig 12, etc., is suppressed to prevent the formation of the thin

films to these parts. The lowering of the speed of forming the thin film on the substrate

7 and the generation of dust are averted.

申请人：TOSHIBA CORP

更多信息请下载全文后查看


本文标签： 专利 门户 全文 地方 下载

版权声明：本文标题：SUBSTRATE HEATER 内容由网友自发贡献，该文观点仅代表作者本人， 转载请联系作者并注明出处：http://roclinux.cn/p/1735367640a1654284.html， 本站仅提供信息存储空间服务，不拥有所有权，不承担相关法律责任。如发现本站有涉嫌抄袭侵权/违法违规的内容，一经查实，本站将立刻删除。