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2024年12月27日发(作者：vscode每行的长度)

专利内容由知识产权出版社提供

专利名称：EMISSION ANALYSIS

发明人：YUASA SHUJI,OMORI YOSHIHISA

申请号：JP17004789

申请日：19890630

公开号：JPH0335146A

公开日：19910215

摘要：PURPOSE:To make exact determination regardless of the change in the state of

a substrate component by previously obtaining the calibration curve with the element

desired to be determined on one reference existence state of the substrate element in a

sample and the ratio of the emission intensity of the element desired to be determined

at the same concn. in the reference existence state of the substrate element and the

other existence state. CONSTITUTION:The calibration curve with the element desired to

be determined on one reference existence state of the substrate element in the sample

and the ratio of the emission intensity of the element desired to be determined at the

same concn. in the reference existence state of the substrate element and the other

existence state are previously determined. The existence state of the substrate element

in the sample to be analyzed is then discriminated by the shape of the histogram of the

emission intensity of the substrate element at every discharge. The concn. of the element

desired to be determined is determined from the calibration curve by using the result

obtd. by multiplying the emission intensity of the element desired to be determined by

the emission intensity ratio according to the discrimination. The exact quantitative analysis

is possible in this way even with the sample in which the existence state of the substrate

element varies in the required time approximately equal to the time required for the

ordinary analysis by the pulse discrimination measurement method used in ordinary

emission analyses.

申请人：SHIMADZU CORP

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