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2024年12月28日发(作者：ascii字符编码最大)

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专利名称：Device and method for manufacturing

substrate

发明人：佐藤 誠人

申请号：JP2018141632

申请日：20180727

公开号：JP2020017706A

公开日：20200130

专利附图：

摘要：Problem to be solved: to provide a substrate processing apparatus which is

advantageous in high throughput by shortening substrate temperature control time. A

substrate processing apparatus is provided with a plurality of substrate temperature

adjusting portions for detecting a temperature of a substrate, a plurality of substrate

temperature adjusting portions in which a mounting portion on which a substrate is

mounted is set at a different temperature, a transferring portion for selectively

transferring a substrate to a plurality of substrate temperature adjusting portions, and a

detection temperature which is the temperature of the substrate detected by the

detecting portion On the basis of this, there is provided a control section for selecting a

substrate temperature adjusting portion to be used as a carrier destination of the

substrate in the plurality of substrate temperature adjusting m

申请人：キヤノン株式会社

地址：東京都大田区下丸子３丁目３０番２号

国籍：JP

代理人：大塚 康徳,大塚 康弘,高柳 司郎,木村 秀二,下山 治,永川 行光

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