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2024年12月28日发(作者：dat是什么文件)

专利内容由知识产权出版社提供

专利名称：Substrate processing apparatus

发明人：前田 正史

申请号：JP2019056325

申请日：20190325

公开号：JP2019114810A

公开日：20190711

专利附图：

摘要：Problem to be solved: to provide a substrate processing apparatus capable of

improving the processing quality in a plurality of processing units. Solution: the substrate

processing apparatus 1 is provided with a plurality of liquid processing units Su for

performing liquid processing on the substrate W, and a plurality of individual air supply

units provided individually in correspondence to the respective liquid processing units Su,

and supplying gas to a single liquid processing unit Su in order to supply a variable gas

quantity Reference numeral 51 denotes a numeral liquid processing unit Su

performs liquid treatment for supplying the treatment liquid to the substrate

individual air supply unit 51 supplies gas to the corresponding liquid processing unit

r, the individual air supply portion 51 can adjust the amount of gas supplied to

the liquid processing ingly, the amount of gas supplied to the liquid

processing unit Su can be varied for each of the liquid processing units ore, the

processing quality in each liquid processing unit Su can be suitably m

申请人：株式会社ＳＣＲＥＥＮホールディングス

地址：京都府京都市上京区堀川通寺之内上る四丁目天神北町１番地の１

国籍：JP

代理人：杉谷 勉,戸高 弘幸,杉谷 知彦,栗原 要

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