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2024年12月27日发(作者：c语言图形化编程)

专利内容由知识产权出版社提供

专利名称：APPARATUS

发明人：DAVIS, Mervyn Howard

申请号：EP02777536.0

申请日：20021113

公开号：EP1444377A1

公开日：20040811

摘要：A vacuum sputterring apparatus capable of depositing a plurality of thin film

layers on a substrate, the apparatus comprising: a vacuum chamber (1) having gas inlet

means and gas evacuation means; a substrate support table (2) arranged to be rotatable

about at least one axis perpendicular to the plane of the table; means for rotating the

substrate support table about said at least one axis; a plurality of sputtering targets (5)

spaced around the walls of the chamber, each sputtering target having electrode means

associated therewith; and means for altering the position of the substrate support table

relative to each one of the plurality of sputtering targets (4) such that in use a substrate

placed on the substrate support table may have a film deposited thereon of atoms

sputtered from at least one of the said plurality of targets and subsequently, following

alteration of the position of the substrate support table, have at least one further film

deposited thereon by exposure to atoms form at least one other of said plurality of

targets. A method of depositing multi-layer materials on a substrate and a method of

controlling stoichiometry of deposited alloys are also provided.

申请人：NORDIKO LIMITED

地址：Hayward Business Centre,New Lane Havant,Hampshire P09 2NL GB

国籍：GB

代理机构：Smaggasgale, Gillian Helen

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