admin 管理员组

文章数量: 1087135


2024年12月27日发(作者：接口测试什么时候进行)

专利内容由知识产权出版社提供

专利名称：GLOW DISCHARGE DECOMPOSING DEVICE

发明人：WATANABE ATSUSHI,OKUBO

DAIGORO,OKAWA KAZUMASA,HIGUCHI

HISASHI

申请号：JP19113588

申请日：19880729

公开号：JPH0243367A

公开日：19900213

摘要：PURPOSE:To form a thin film of amorphous Si at a high rate on a substrate to be

treated with good efficiency of utilizing gaseous SiH4 by applying a magnetic field to a

glow discharge generating region at the time of decomposing the gaseous SiH4 by glow

discharge and forming the thin film of amorphous Si on the substrate. CONSTITUTION:A

cylindrical electrode 2 made of Al for glow discharge is provided in a cylindrical reaction

vessel 1 made of metal and gaseous SiH4 ejection ports 9 are bored over the entire

surface thereof. The cylindrical substrate 4 mounted to a cylindrical substrate support 3

is disposed to the inner central part thereof. The gaseous SiH4 is introduced into the

vessel 1 from a gas introducing port 8 and is blown from the ejection ports 9 to the

surface of the substrate 4 which is heated by a heater 6 and is rotated by a motor 7. The

glow discharge is simultaneously generated by the vessel 1 by a high-frequency power

source 1 to decompose the SiH4 and to form the thin film of the amorphous Si on the

surface of the substrate 4. Many magnet parts consisting of permanent magnets 13a and

ferromagnetic materials 13b such as Ni are provided to the outer peripheral surface of an

electrode plate 2 for glow discharge on both sides of the gas ejection ports 9, by which

the magnetic fields of the glow discharge region are increased and the thin film of the

amorphous Si is formed at the high rate on the substrate 2 with the good efficiency of the

gaseous raw materials.

申请人：KYOCERA CORP

更多信息请下载全文后查看


本文标签： 专利 测试 接口 全文

版权声明：本文标题：GLOW DISCHARGE DECOMPOSING DEVICE 内容由网友自发贡献，该文观点仅代表作者本人， 转载请联系作者并注明出处：http://roclinux.cn/p/1735344274a1651020.html， 本站仅提供信息存储空间服务，不拥有所有权，不承担相关法律责任。如发现本站有涉嫌抄袭侵权/违法违规的内容，一经查实，本站将立刻删除。